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Mask shop
A mask shop is a factory which manufactures photomasks for use in the semiconductor industry. There are two distinct types found in the trade. Captive mask shops are in-house operations owned by the biggest semiconductor corporations, while merchant mask shops make masks for most of the industry.
Merchant mask shops will produce photomasks for a variety of integrated device manufacturers (IDMs), foundries or optical device companies in addition to providing excess cavity work and re-pellicle for captive mask shops.
The company structure is similar to that of any medium-sized manufacture and has the following unique departments or mask makers:
- Sales Customer / customer services
- Front end data prep
- Facilities maintenance - plant & environment
- Engineering - equipment maintenance
- Engineering - process, inspection & metrology
- Quality assurance
- Shipping & dispatching
Photomask market
The worldwide photomask production market was $3.1 billion in 2013. Almost half of market attributed to captive mask shops (in-house mask shops of major chipmakers).
Infrastructure (technical and financial)
The costs of creating new mask shop for 180 nm processes were estimated in 2005 as $40 million, and for 130 nm - more than $100 million. In 2013 cost of new 28 nm mask shop was estimated at $110 – 140 million.
Future
As technology shrinks, the cost to mask shops increase and the product turn around time grow longer as well.
References
References
- Tracy, Dan. (April 14, 2014). "SEMI Reports 2013 Semiconductor Photomask Sales of $3.1 Billion". SEMI.
- [http://www.sematech.org/meetings/archives/litho/7533/berglund.pdf An Analysis of the Economics of Photomask Manufacturing Part – 1: The Economic Environment] {{Webarchive. link. (2016-03-03 , Weber, February 9, 2005. Slide 6 "The Mask Shop’s Perspective")
- Hayes, Caroline. (September 23, 2013). "EDA-IP Update. Photomask, the industry's Cinderella". ChipDesignMag.
This article was imported from Wikipedia and is available under the Creative Commons Attribution-ShareAlike 4.0 License. Content has been adapted to SurfDoc format. Original contributors can be found on the article history page.
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